The SAS proposals for participation in FP6 projects
are listed in blocks according to the FP6 priority theme structure

FP6 priority
1.1.2   Information Society Technologies
Title of the proposal

Oxide films for new microelectronic devices

Slovak Academy of Sciences, Institute of Electrical Engineering
Dubravska cesta 9, 842 39 Bratislava, Slovak Republic
+421 2 54775826

Research subject for a potential FP6 project

Rapid scaling down dimensions of CMOS devices and increase of density and storage capacity of computers demand introduction of new materials in integrated circuits technology. Functional oxides offer potential for replacing silicon oxide in today production. Oxide films exhibit unique properties, such as excellent dielectric characteristics, ferrolectric character, and if necessary high electric conductivity. Based on our experience and developed technology we propose to employ metal-organic chemical vapour deposition (MOCVD) technique for preparation of thin oxide films and multilayers for usage in future micro- and nanoelectronic applications. Up to now we have succeeded in preparation of several types of oxide layers which could be used in new generation of micro- and nanoelectronic devices: SrTiO3, ZrO2, CeO2, RuO2, LaSrMnO3 etc.

Recent international cooperation of the research team

LMGP INPG Grenoble, France,
ICMAB Barcelona, Spain,
Univ. Helsinki,Helsinki, Finland,
IMEC Leuven, Belgium
Univ. Vilnius, Vilnius, Lithuania.

Proposerīs relevant publications related to the research subject

Frohlich, K., Machajdik, D., Weiss, F., Bochu, B.: Thin epitaxial CeO2 films prepared by aerosol MOCVD, Materials Lett. 21 (1994) 377.

Frohlich, K., Machajdik, D., Rosova, A., Vavra, I., Weiss, F., Bochu, B., and Senateur, J.P.: Growth of SrTiO3 thin epitaxial films by aerosol MOCVD, Thin Solid Films 260 (1995) 187.

K. Frohlich, D. Machajdik, V. Cambel, I. Kostic, S. Pignard: Epitaxial growth of low-resistivity RuO2 films on -oriented Al2O3 substrate, J. Cryst. Growth 235 (2002) 377.

K. Frohlich, J. Souc, D. Machajdik, M. Jergel, J. Snauwaert, and L. Hellemans: Surface quality of epitaxial CeO2 thin films grown on sapphire by aerosol MOCVD, Chem. Vap. Deposition 4 (1998) 216.